Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies

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Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.

Nanolithography contains updated reviews by major experts on the well established techniques – electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) – as well as on emergent techniques, such as scanning tunnelling lithography (STL).