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This text consists of a comprehensive and critical compilation of data for the following materials and properties: diffusion in silicon, germanium and their alloys; diffusion in compound semiconductors; diffusion in silicides; chemical diffusion in bulk inhomogeneous semiconductors; grain-boundary and dislocation diffusion in semiconductors and silicides; and surface diffusion on semiconductors. Although most of the silicides are not semiconducting, this chapter is included because a number of them have become integrated in the Si technology and because they have not been treated in previous volumes.
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This text consists of a comprehensive and critical compilation of data for the following materials and properties: diffusion in silicon, germanium and their alloys; diffusion in compound semiconductors; diffusion in silicides; chemical diffusion in bulk inhomogeneous semiconductors; grain-boundary and dislocation diffusion in semiconductors and silicides; and surface diffusion on semiconductors. Although most of the silicides are not semiconducting, this chapter is included because a number of them have become integrated in the Si technology and because they have not been treated in previous volumes.